The masked side of the mirror plane can change automatically based on the artist’s view, or be locked to one side.Īdditionally, the mirror plane can now be locked onto an object or locator, so that the reflected edge of the mirror projection can be manipulated to the best symmetrical position and orientation. The feature comes with mirror masking, which prevents secondary projected paint overlapping across the mirror plane, ensuring the paint meets at the mirror plane with a perfectly reflected edge.
Now, artists can paint on one side of a mirror plane while Mari projects the same paint to the other side of the mirror plane, dramatically increasing efficiency. Previously, painting the same designs on both sides of a symmetrically formed model required a considerable amount of asset preparation with a lot of repetitive actions. Mirror projection brings simultaneous, symmetrical painting workflows to Mari, without the need for specialized UV layouts.
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